ELECTROMIGRATION INDUCED EDGE VOID DYNAMICS ON THE INTERCONNECT SURFACE Four Fold Crystal Symmetry, {100} Planes in FCC The effect of the low electron wind intensity χ≤10 on the surface
topology of an interconnect line with FCC structure having four fold crystal
symmetry, and oriented with a tilt angle θ=0 degrees is illustrated. The originally
Gaussian in shape edge-void on the surface starts to evolve into a kink shape
disturbance , which shows continuous growth in size while drifting towards the
cathode end of the interconnect line. At the moderate wind intensities χ≈25 , the
kink shape surface disturbance breaks down and creates very large wedge shape
internal void, while becoming very close to the opposite sidewall of the
interconnect. On the other hand, at e. the extremely high electron wind intensities χ≥50 , the lower edge of the kinked shape surface void grows so much that
eventually hits the opposite sidewall before having enough time to break down into
internal daughter voids. Therefore this type textures are very critical and cause an
open circuit failure by reaching the other edge. The failure time depends on the
degree of anisotropy in diffusion coefficient and the electron wind intensity. |
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